Semiconductors and Semiconductor Equipment
Company Overview of SEMATECH, Inc.
SEMATECH, Inc., doing business as International Sematech, develops and manufactures semiconductors. It focuses on commercializing research and development, and other technologies. The company was incorporated in 1987 and is based in Albany, New York.
257 Fuller Road
Albany, NY 12203
Founded in 1987
Key Executives for SEMATECH, Inc.
Chief Executive Officer and President
Vice President of Finance and Administration
Chief Technologist and Senior Director
Secretary and General Counsel
Vice President of Emerging Technologies
Compensation as of Fiscal Year 2014.
SEMATECH, Inc. Key Developments
Sematech Names Ronald Goldblatt as Permanent President and CEO
Nov 7 14
Sematech named Ronald Goldblatt its permanent president and CEO. Goldblatt has been the acting president and CEO of the company for the past eight months following the departure of Dan Armbrust. Goldblatt previously worked as Sematech's vice president of technical strategy and operations. Prior to that, he worked in IBM's microelectronics division.
SEMATECH, Inc. Presents at SelectUSA 2013 Investment Summit, Oct-31-2013 11:00 AM
Oct 29 13
SEMATECH, Inc. Presents at SelectUSA 2013 Investment Summit, Oct-31-2013 11:00 AM. Venue: Washington, District Of Columbia, United States. Speakers: Daniel Armbrust, Chief Executive Officer and President.
SEMATECH Partners with SUSS MicroTec to Speed Commercialization of Mask Lithography for Semiconductor Manufacturing
Oct 7 13
SUSS MicroTec and SEMATECH announced that SUSS MicroTec's photomask equipment division has partnered with SEMATECH to investigate and develop extreme ultraviolet lithography (EUVL) substrate and blank cleaning technologies that will accelerate process availability for extreme ultraviolet pilot line manufacturing. As a SEMATECH member, SUSS MicroTec's photomask equipment division will collaborate with the consortium's EUV mask experts to focus on improving the cleaning yield on EUVL mask blanks, patterned masks and non-patterned EUVL substrates. The long-term goal of this collaboration is to increase the manufacturing yield for substrates and mask blanks with the lowest defect counts at nonprintable defect sizes. In a cooperative approach to enable preservation of mask cleanliness and avoid the risk of repeated printing of defects, SEMATECH is researching practical solutions for defect reduction to enable high-volume EUVL manufacturing. The collaborative work between SUSS MicroTec and SEMATECH's lithography research teams will develop both wet and dry cleaning methods, targeting major reduction in soft defects as well as surface pitting and functional layer degradation.
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