July 29, 2014 12:50 AM ET

Semiconductors and Semiconductor Equipment

Company Overview of SEMATECH, Inc.

Company Overview

SEMATECH, Inc., doing business as International Sematech, develops and manufactures semiconductors. It focuses on commercializing research and development, and other technologies. The company was incorporated in 1987 and is based in Albany, New York.

257 Fuller Road

Suite 2200

Albany, NY 12203

United States

Founded in 1987





Key Executives for SEMATECH, Inc.

Chief Executive Officer and President
Vice President of Finance and Administration
Chief Technologist and Senior Director
Secretary and General Counsel
Vice President of Emerging Technologies
Age: 47
Compensation as of Fiscal Year 2014.

SEMATECH, Inc. Key Developments

SEMATECH, Inc. Presents at SelectUSA 2013 Investment Summit, Oct-31-2013 11:00 AM

SEMATECH, Inc. Presents at SelectUSA 2013 Investment Summit, Oct-31-2013 11:00 AM. Venue: Washington, District Of Columbia, United States. Speakers: Daniel Armbrust, Chief Executive Officer and President.

SEMATECH Partners with SUSS MicroTec to Speed Commercialization of Mask Lithography for Semiconductor Manufacturing

SUSS MicroTec and SEMATECH announced that SUSS MicroTec's photomask equipment division has partnered with SEMATECH to investigate and develop extreme ultraviolet lithography (EUVL) substrate and blank cleaning technologies that will accelerate process availability for extreme ultraviolet pilot line manufacturing. As a SEMATECH member, SUSS MicroTec's photomask equipment division will collaborate with the consortium's EUV mask experts to focus on improving the cleaning yield on EUVL mask blanks, patterned masks and non-patterned EUVL substrates. The long-term goal of this collaboration is to increase the manufacturing yield for substrates and mask blanks with the lowest defect counts at nonprintable defect sizes. In a cooperative approach to enable preservation of mask cleanliness and avoid the risk of repeated printing of defects, SEMATECH is researching practical solutions for defect reduction to enable high-volume EUVL manufacturing. The collaborative work between SUSS MicroTec and SEMATECH's lithography research teams will develop both wet and dry cleaning methods, targeting major reduction in soft defects as well as surface pitting and functional layer degradation.

Entegris, Inc. Announces Partnership with Sematech to Advance Surface Conditioning and Wafer Cleaning Technology for Semiconductor Device Manufacturing

Entegris, Inc. and Sematech announced that they have partnered to move forward the development of advanced nanoscale particle removal processes and cleaning technologies for next-generation wafers and devices. This collaboration will address some of the profound changes taking place in the semiconductor industry that are impacting fundamental aspects of process and equipment design--such as integration of new materials and process technology for sub-20 nm node manufacturing, next-generation lithography requirements and the progression to 450 mm wafers. One key issue relates to the preparation of critical surfaces through the entire semiconductor manufacturing process. Entegris will work with experts from SEMATECH's Nanodefect Center to develop new technologies and solutions to reduce nano-scale particle contamination during wafer processing.

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