April 18, 2014 4:11 PM ET

Software

Company Overview of Coventor, Inc.

Company Overview

Coventor, Inc. provides 3D micro-electromechanical systems (MEMS) simulation, analysis, and design automation software. It offers MEMS+ to develop products to combine traditional ICs with MEMS devices; provide an integrated systems-to-silicon MEMS+IC design flow to collaborate MEMS designers, systems architects, and IC designers for working; and allow MEMS designers to work in a 3D environment that suits their needs, as well as deliver parameterized behavioral models that are compatible with the design and simulation environment required by IC designers and system architects. It offers CoventorWare for MEMS CAD design, multiphysics modeling, and simulation to design and develop new MEMS prod...

4000 CentreGreen Way

Suite 190

Cary, NC 27513

United States

Founded in 1996

Phone:

919-854-7500

Fax:

919-854-7501

Key Executives for Coventor, Inc.

Chief Technology Officer
Vice President of Sales & Business Development
Age: 49
Vice President of Engineering
Compensation as of Fiscal Year 2013.

Coventor, Inc. Key Developments

Coventor, Inc. Enhances SEMulator3D Virtual Fabrication Platform to Address Advanced 3D Process Development Challenges

Coventor Inc. announced the immediate availability of the SEMulator3D(R) 2014 software platform. The latest version of the integrated modeling tool enhances the visibility, accuracy and performance with which engineers can analyze next-generation manufacturing technologies, and dramatically reduce the time and cost of traditional build-and-test silicon learning cycles in the 3D era. A key feature of the 2014 release is the ability to quickly and precisely model pattern dependent etch effects, which are critical to a new generation of 3D technologies. The tool has been enhanced to provide increased sensitivity to the design parameters and underlying topography that result from the etch processes used in 3D structures. The latest version of SEMulator3D uses a combination of detailed design-specific data and predictive 3D models to enable fast and accurate modeling of pattern-dependent etch effects. This in-depth modeling of design-technology interaction results in increased yield, reliability and performance by the process technology, and does so with no compromise in overall tool performance. In addition to support for pattern dependent etch modeling, SEMulator3D 2014 offers higher performance to increase the speed of modeling and analysis of all types of structures and devices, In addition, a range of new user productivity features to enhance efficiency and usability of the platform have been added. These features are especially critical as the size and complexity of process technology models escalate, and more iterative analysis and experimentation is required. SEMulator3D 2014 includes a full-production version of the popular, time-saving Structure Search feature. Structure Search allows technology developers to examine their entire structural models for specific criteria, checking for potential yield-limiting mechanisms. This feature effectively gives users the capability to find problems in places where they didn't know to look. By coupling Structure Search with other automation features released in 2013, like the tool's Expeditor and Virtual Metrology features, SEMulator3D now offers technologists the most efficient way to examine process margins and design rule sensitivities in a fast, automated virtual environment, rather than wasting time and money on costly in-fab experiments. Among the other new features and enhancements to improve performance and user productivity are: modeling performance enhancements - selective conformal (basic) etch now multi-threaded, and multi-etch speed enhancement; layout-aware rebuild - improves modeling performance response to design changes; new GUI for the tool's expeditor feature - makes complex multi-dimensional DOEs easier to setup and execute; and crystal etch moved into the tool's process editor - popular custom python, now in process library.

Coventor, Inc. Announces its MEMS+ 4.0 Software Suite for Accelerating Development of Advanced MEMS Devices and Systems

Coventor, Inc. announced its MEMS+® 4.0 software suite for accelerating development of advanced MEMS devices and systems. The MEMS+ suite enables MEMS and IC designers to rapidly explore and optimize designs in parallel in the MathWorks MATLAB and Cadence Virtuoso® environments. The MEMS+ 4.0 release features a new capability to export models in Verilog-A format and a full 64-bit implementation that allows more accurate modeling of complex MEMS sensors and actuators. The MEMS+ 4.0 suite is a key part of its platform for MEMS development, which also includes the CoventorWare® and SEMulator3D software suites. The platform provides a complete solution for designing and verifying accelerometers, gyroscopes, microphones and many other types of MEMS. This latest release of the MEMS+ suite extends the scope of the platform by providing a ‘tunable’ accuracy-versus-speed approach for co-designing MEMS and integrated circuits (ICs) and compatibility with more EDA analog/mixed-signal simulation environments.

Coventor Ships Latest Version of MEMS+IC Co-Design Platform to Accelerate Development of Complex 3D Electronics Systems

Coventor, Inc. announced immediate availability of its new MEMS+(R) 3.0 design platform that accelerates development of complex 3D systems with actuators, accelerometers and gyroscopes, microphones and other types of MEMS devices. The MEMS+ 3.0 platform enables MEMS designers to explore device concepts and optimize designs much faster than using conventional field solvers. It also bridges the gap between the accuracy required by MEMS designers and the simulation speed required by ASIC designers with a common model for MEMS and ASIC co-design that eliminates months of engineering effort. Key to delivering these advantages are MEMS+ 3.0 advancements focused on more accuracy with new high-order beam, shell and brick elements; new physics such as squeezed-film gas damping in transient simulations of MEMS actuators; and simulations of package thermal deformation effects on MEMS sensors. In particular, the addition of fluidics to the existing mechanical and electrostatic modeling capabilities of the platform enables fully coupled simulations to predict performance metrics like noise or actuation time previously realized only through costly build-and-test cycles. The MEMS+ 3.0 platform is built on speed, capacity and integration improvements implemented across the entire software suite, including a built-in simulator, parallel processing support, selective linearization, and more complete scripting interfaces. The built-in simulator handles basic MEMS analysis tasks, making it easy to verify models before exporting to the MATLAB or Cadence Design Systems environments. The parallel processing support for Simulink and the Cadence APS simulator ensures that simulation speed scales well on multi-core and multi-processor systems. Selective linearization of model components further enhances simulation speed, enabling MEMS+ models to simulate as fast as handcrafted models while retaining key non-linear effects. Full scripting interfaces are available in both MATLAB and Python scripting consoles so users can automate entire flows from design creation to simulation and post processing, saving time and producing better designs through more extensive parameter studies.

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