Company Overview of Coventor, Inc.
Coventor, Inc. provides 3D micro-electromechanical systems (MEMS) simulation, analysis, and design automation software. It offers MEMS+ to develop products to combine traditional ICs with MEMS devices; provide an integrated systems-to-silicon MEMS+IC design flow to collaborate MEMS designers, systems architects, and IC designers for working; and allow MEMS designers to work in a 3D environment that suits their needs, as well as deliver parameterized behavioral models that are compatible with the design and simulation environment required by IC designers and system architects. It offers CoventorWare for MEMS CAD design, multiphysics modeling, and simulation to design and develop new MEMS prod...
4000 CentreGreen Way
Cary, NC 27513
Founded in 1996
Key Executives for Coventor, Inc.
Vice President of Sales & Business Development
Vice President of Engineering
Compensation as of Fiscal Year 2014.
Coventor, Inc. Key Developments
Coventor, Inc. Announces Availability of MEMS+ Design Solution for Accelerating Development of Advanced MEMS Devices and Systems
Sep 8 14
Coventor, Inc. announced the availability of the latest version of its MEMS+ design solution for accelerating development of advanced MEMS devices and systems. MEMS+ 5.0 features an expanded modeling library to enable simulation of a greater variety of devices, with a particular focus on the unique challenges of micro-mirrors and piezo-electric devices. It also adds a new capability to create and export reduced-order models (ROMs) to the MATLAB Simulink environment from The MathWorks, Inc. to enable extremely fast and accurate non-linear simulations of MEMS-based systems. This supplements the existing capability to export ROMs in Verilog-A format for simulations of MEMS with electronics in widely used EDA simulators such as the Cadence® Spectre® circuit simulator. The MEMS+ suite enables MEMS and IC designers to rapidly explore and optimize designs in parallel in the MathWorks MATLAB/Simulink and Cadence Virtuoso environments. It is a key part of Coventor’s platform, which also includes the CoventorWare and SEMulator3D suites. The platform provides a complete solution for designing and verifying accelerometers, gyroscopes, microphones, microprojectors and many other types of MEMS sensors and actuators. This latest release of the MEMS+ suite features an improved model library for accurately simulating an even wider range of device types and structures, including new electrostatic comb drive models between movable and flexible structures, improved side electrode and side contact models, squeezed-film damping models for side electrodes, support for modeling out-of-plane flexible structures such as corrugations, enhanced support for modeling piezo-electric sensors and actuators, generic spring and damper models, the new library models were developed in response to customer requests and particularly support engineers tasked with creating new micro-projectors for smartphones or gyros and energy harvesters for automotive and industrial applications. A major highlight of MEMS+ 5.0 are the new capabilities to create and export non-linear ROMs.
Coventor Announces the Release of CoventorWare Suite
Jun 29 14
Coventor, Inc. announced immediate availability of its new CoventorWare 2014 suite, the solution for advanced modeling and simulation of MEMS devices. The latest release delivers enhanced levels of performance, automation and accuracy for designing a new generation of sophisticated MEMS devices – such as accelerometers, gyroscopes, microphones, and micro-actuators — to reduce overall development costs and time.
Coventor, Inc. Enhances SEMulator3D Virtual Fabrication Platform to Address Advanced 3D Process Development Challenges
Mar 31 14
Coventor Inc. announced the immediate availability of the SEMulator3D(R) 2014 software platform. The latest version of the integrated modeling tool enhances the visibility, accuracy and performance with which engineers can analyze next-generation manufacturing technologies, and dramatically reduce the time and cost of traditional build-and-test silicon learning cycles in the 3D era. A key feature of the 2014 release is the ability to quickly and precisely model pattern dependent etch effects, which are critical to a new generation of 3D technologies. The tool has been enhanced to provide increased sensitivity to the design parameters and underlying topography that result from the etch processes used in 3D structures. The latest version of SEMulator3D uses a combination of detailed design-specific data and predictive 3D models to enable fast and accurate modeling of pattern-dependent etch effects. This in-depth modeling of design-technology interaction results in increased yield, reliability and performance by the process technology, and does so with no compromise in overall tool performance. In addition to support for pattern dependent etch modeling, SEMulator3D 2014 offers higher performance to increase the speed of modeling and analysis of all types of structures and devices, In addition, a range of new user productivity features to enhance efficiency and usability of the platform have been added. These features are especially critical as the size and complexity of process technology models escalate, and more iterative analysis and experimentation is required. SEMulator3D 2014 includes a full-production version of the popular, time-saving Structure Search feature. Structure Search allows technology developers to examine their entire structural models for specific criteria, checking for potential yield-limiting mechanisms. This feature effectively gives users the capability to find problems in places where they didn't know to look. By coupling Structure Search with other automation features released in 2013, like the tool's Expeditor and Virtual Metrology features, SEMulator3D now offers technologists the most efficient way to examine process margins and design rule sensitivities in a fast, automated virtual environment, rather than wasting time and money on costly in-fab experiments. Among the other new features and enhancements to improve performance and user productivity are: modeling performance enhancements - selective conformal (basic) etch now multi-threaded, and multi-etch speed enhancement; layout-aware rebuild - improves modeling performance response to design changes; new GUI for the tool's expeditor feature - makes complex multi-dimensional DOEs easier to setup and execute; and crystal etch moved into the tool's process editor - popular custom python, now in process library.
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