December 17, 2014 5:38 PM ET

Chemicals

Company Overview of Voltaix LLC

Company Overview

Voltaix LLC manufactures specialty chemicals. It offers boron products, such as boron trifluoride, boron trifluoride mixtures, diborane, diborane mixtures, trimethylboron, trimethylboron mixtures, and trimethylboron in silane mixtures; germanium products, including germane, solar grade germane, germane mixtures, digermane, digermane mixtures, and germanium tetrafluoride; and phosphorous products, such as phosphine and phosphine mixtures. The company also provides organosilanes, including dow corning methysilanes, methylsilane, methylsilane mixtures, low oxygen methylsilane, dimethylsilane, trimethylsilane, and tetramethylsilane; silicon products, such as silane, silane mixtures, disilane, di...

3121 Route 22 East

Suite 200

Branchburg, NJ 08876

United States

Founded in 1986

Phone:

908-231-9060

Fax:

908-231-9063

Key Executives for Voltaix LLC

Chief Executive Officer and President
Chief Financial Officer
Executive Vice President of Operations & Technology and Director
Age: 51
Vice President of Corporate Finance
Chief Technology Officer and Executive Vice President of Sales & Marketing
Compensation as of Fiscal Year 2014.

Voltaix LLC Key Developments

Voltaix, LLC and Linde Electronics Limited Boost Disilane Production Capacity in USA

Voltaix, LLC and Linde Electronics Limited announced the signing of an agreement to expand disilane (Si(2) H(6)) capacity with the construction of a 40 metric ton Ultra High Purity (UHP) disilane plant. The plant, employing Voltaix patented technology, is located at Voltaix's recently constructed, manufacturing site in Upper Mt. Bethel Township, Pennsylvania (USA). New capacity is required to meet the global market demand and the plant is now in operation and customer qualification is underway. The two companies are also discussing plans to install disilane supporting infrastructure at a Voltaix site in Asia. Disilane is a critical material that enables polysilicon to be deposited at lower temperatures with enhanced surface smoothness and increased step coverage versus silane and other conventional silicon precursors. It is used in the production of advanced memory and microprocessor chips, and disilane consumption is projected to grow sharply as device sizes shrink below 20nm.

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