Electronic Equipment, Instruments and Components
Company Overview of Gigaphoton, Inc.
Gigaphoton, Inc. develops, manufactures, and sells excimer laser products used for lithography tools in the semiconductor manufacturing industry in Japan and internationally. It offers Remote Equipment Data Management that remotely monitors excimer laser units via the Internet. The company was founded in 2000 and is based in Oyama-shi, Japan with an additional office in Hiratsuka-shi, Japan. It has sales and support bases in Japan, North America, Korea, China, Taiwan, Singapore, Europe, and the United States. Gigaphoton Inc. operastes as a subsidiary of Komatsu Ltd.
Founded in 2000
Key Executives for Gigaphoton, Inc.
Executive Officer of Development
Executive officer of Control
Senior Executive Officer and Director
Compensation as of Fiscal Year 2013.
Gigaphoton, Inc. Key Developments
Gigaphoton, Inc. Ships its First ArF Excimer Laser Capable of Supporting 450mm Wafer Multi-Patterning Lithography
Jul 1 13
Gigaphoton, Inc. shipped the GT64A, its first ArF immersion Excimer laser supporting 450mm multi-patterning and featuring the maximum power output of 120W, to a major lithography scanner manufacturer. The semiconductor manufacturing industry is currently working on technological innovation which enables the commercial production of 450mm wafers, and expects that Gigaphoton's GT64A will accelerate the pace of commercial production and improve the yields of 450mm wafers. The GT64A is the latest model of the GT Series and is capable of a high throughput of 120W in a multi-patterning lithography of 450mm wafers. Power output can be automatically adjusted to optimal levels according to the customers' process. Thanks to its highly stable energy output, spectral bandwidth and beam profile, combined with longer pulse durations, the GT64A also offers greatly improved overlay accuracy, critical dimension control and minimization of line edge roughness, all of which are extremely important in multi-patterning lithography. To reduce customers' operating costs, Gigaphoton has addressed the reduction of environmental impact when developing the GT64A, and successfully cut down customers' costs of facilities and equipment for electricity, gas and cooling resources.
Gigaphoton Establishes Branch and Starts Business Operations in Singapore
Apr 5 13
Gigaphoton, Inc. announced that as of April 2013, it has started business operations at the Gigaphoton Singapore Branch, its newly established branch in that country. Through this Singapore Branch, Gigaphoton will aggressively promote new business opportunities to find potential customers in Singapore by teaming up with lithography system manufacturers as well as further reinforce its local technical support system for existing Singaporean customers of Gigaphoton excimer lasers for semiconductor lithography systems.
Gigaphoton, Inc. Achieves Maximum 20W EUV Light Source Output
Feb 18 13
Gigaphoton, Inc. announced that the company has achieved EUV light output equivalent to maximum of 20W for its laser-produced plasma (LPP) light sources for EUV lithography scanners. This result was obtained by irradiating the Sn target (tin droplet) with a solid-state pre-pulse laser and a CO(2) laser at 100kHz. An average EUV output of 10W was confirmed during operation. Considering that the current commercially accepted EUV output levels are around 10W, the results demonstrated by Gigaphoton represents that a critical achievement has been reached for pre-production level output. Gigaphoton is committed to continuing development efforts targeting 250W output. Gigaphoton has focused on developing high output, stable, and economical LPP light sources since 2002. The unique LPP light source technology introduced by Gigaphoton extends the lifetime of droplet generators by utilizing ultra-small tin droplets on-demand, reducing downtime and cost. In addition, high EUV output conversion efficiency has been achieved through the optimized combination of short wavelength solid-state pre-pulse laser and CO(2) laser as the main pulse. This technology contributes to the real possibility of achieving efficient, high output EUV light sources. In order to maximize the life of the collector mirror, a superconducting magnet is used to generate a powerful magnetic field that guides the unwanted debris resulting from the thermal expansion of the tin droplets towards the tin catcher. This results in further reduction of cost and downtime.
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