December 28, 2014 10:25 AM ET

Electronic Equipment, Instruments and Components

Company Overview of Gigaphoton, Inc.

Company Overview

Gigaphoton, Inc. develops, manufactures, and sells excimer laser products used for lithography tools in the semiconductor manufacturing industry in Japan and internationally. It offers Remote Equipment Data Management that remotely monitors excimer laser units via the Internet. The company was founded in 2000 and is based in Oyama-shi, Japan with an additional office in Hiratsuka-shi, Japan. It has sales and support bases in Japan, North America, Korea, China, Taiwan, Singapore, Europe, and the United States. Gigaphoton Inc. operastes as a subsidiary of Komatsu Ltd.

400 Yokokurashinden

Oyama-shi,  323-8558


Founded in 2000


81 2 8528 8410


81 2 8528 8439

Key Executives for Gigaphoton, Inc.

Chief Executive Officer
Chief Technology Officer
Executive Officer of Development
Executive officer of Control
Senior Executive Officer and Director
Compensation as of Fiscal Year 2014.

Gigaphoton, Inc. Key Developments

Gigaphoton, Inc. Achieves 92 W EUV Light Source Output at 4.2% CE

Gigaphoton, Inc. announced that it has successfully achieved 92 W EUV light source output at 4.2% conversion efficiency (CE) on its prototype laser-produced plasma (LPP) light sources for EUV lithography scanners. The 92 W output was achieved by irradiating an Sn target (tin droplet) with a solid-state pre-pulse laser and a CO(2) laser after combining and optimizing these lasers. Gigaphoton remains committed to continuing its R&D efforts, targeting 150 W output by the end of 2014 and ultimately up to 250 W output for high-volume manufacturing. The prototype LPP light source that has achieved 92 W output with Gigaphoton's unique technologies allows emission of EUV by radiating ultra-small tin (Sn) droplets of less than 20 m in diameter with the solid-state pre-pulse laser and main pulse CO(2) laser. In addition, a combination of a high-output superconducting magnet and Sn etching allows suppression of Sn debris caused by radiation. To maximize the life of the collector mirror, a high-output superconducting magnet generates a powerful magnetic field to guide unwanted debris caused by thermal expansion of the tin droplets towards the tin catcher.

Gigaphoton, Inc. Develops Helium-Free Purge Process for ArF Immersion Lasers

Gigaphoton, Inc. announced that it has succeeded in the development of an innovative purge process, one that does not use the rare gas helium, for its "GT Series" of ArF immersion lasers. Evolving its "Green Innovations" environmental technologies, this innovative helium-free purge process enables significant reduction of helium consumption for lithography tools. On Earth, helium is a rare gas -- 5.2 ppm by volume in the atmosphere. It is mainly mined as a byproduct when natural gas is mined. Helium has been used in various industries, including for medical equipment, linear motor cars, and semiconductors, and is indispensable for modern life. But consumption of helium in manufacturing has been increased dramatically, and it is forecast that helium supply will be depleted in approx. 25 years if consumption continues at the current rate. So, the unstable supply and price rise of helium has become a serious issue today.

Gigaphoton, Inc. Ships its First ArF Excimer Laser Capable of Supporting 450mm Wafer Multi-Patterning Lithography

Gigaphoton, Inc. shipped the GT64A, its first ArF immersion Excimer laser supporting 450mm multi-patterning and featuring the maximum power output of 120W, to a major lithography scanner manufacturer. The semiconductor manufacturing industry is currently working on technological innovation which enables the commercial production of 450mm wafers, and expects that Gigaphoton's GT64A will accelerate the pace of commercial production and improve the yields of 450mm wafers. The GT64A is the latest model of the GT Series and is capable of a high throughput of 120W in a multi-patterning lithography of 450mm wafers. Power output can be automatically adjusted to optimal levels according to the customers' process. Thanks to its highly stable energy output, spectral bandwidth and beam profile, combined with longer pulse durations, the GT64A also offers greatly improved overlay accuracy, critical dimension control and minimization of line edge roughness, all of which are extremely important in multi-patterning lithography. To reduce customers' operating costs, Gigaphoton has addressed the reduction of environmental impact when developing the GT64A, and successfully cut down customers' costs of facilities and equipment for electricity, gas and cooling resources.

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