Semiconductors and Semiconductor Equipment
Company Overview of IMS Nanofabrication AG
IMS Nanofabrication AG develops lithography tools for the semiconductor and nanotech industry. The company focuses on massively parallel charged particle beam technologies (electron- and ion-beam) for lithography and patterning solutions for various substrates. Its solutions include mask writers, such as a 50keV electron multi-beam column of a mask exposure tool (eMET) for the fabrication of complex masks and templates; direct write solutions, including a projection mask-less lithography solution, which is a direct write multi-beam configuration based on 50 keV electron projection; and nanopatterning tools, such as a charged particle nanopatterning tool that enables 2D and 3D nanopatterning ...
Founded in 2006
Key Executives for IMS Nanofabrication AG
Chief Executive Officer and General Manager
Vice President of Intel Capital
Compensation as of Fiscal Year 2014.
IMS Nanofabrication AG Key Developments
IMS Nanofabrication AG Announces Partnership with JEOL Ltd. for the Realization of Alpha and Beta Electron Multi-Beam Mask Writer Tools
Sep 3 13
IMS Nanofabrication AG announced that a partnership was formed with JEOL Ltd. for the realization of Alpha and Beta electron multi-beam mask writer (MBMW) tools for the 10nm half-pitch mask technology node. For this purpose IMS Nanofabrication has developed and demonstrated a multi-beam write engine providing 262,000 programmable beams of 50keV energy.
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