Last €72.81 EUR
Change Today +0.26 / 0.36%
Volume 895.9K
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As of 11:35 AM 08/29/14 All times are local (Market data is delayed by at least 15 minutes).
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Company Description

Contact Info

De Run 6501

Veldhoven, 5504 DR

Netherlands

Phone: 31 40 268 3000

Fax:

ASML Holding N.V. designs, manufactures, markets, and services semiconductor processing equipment used in the fabrication of integrated circuits (ICs). The company serves chip manufacturers in approximately 70 locations in 16 countries. Products The company develops lithography systems and related products for the semiconductor industry and related patterning applications. Its product development strategy focuses on the development of product families based on a modular, upgradeable design. The company’s older PAS 2500 and PAS 5000 lithography systems are used with g-line and i-line light sources for processing wafers up to 150 mm in diameter and are employed in manufacturing environments and in special applications for which design resolutions of 0.5 microns and above are required. The company’s PAS 5500 product family comprises advanced wafer steppers and Step & Scan systems equipped with i-line, Krypton Fluoride (KrF) and Argon Fluoride (ArF) light sources for processing wafers up to 200 mm in diameter and are employed in volume manufacturing to achieve design nodes requiring imaging at a resolution down to 90 nanometer (nm). The company offers TWINSCAN systems, based on i-line, KrF, and ArF light sources for processing wafers up to 300 mm in diameter for manufacturing environments for which imaging at a resolution down to 38 nm are required. The TWINSCAN platform is the basis for the company’s Step-and Scan systems, which are capable of extending shrink technology down to 38 nm and beyond with multiple patterning techniques. The company produces dual-stage design TWINSCAN systems. With a TWINSCAN system, wafer measurement, including focus and alignment, is completed on the dry stage, while the imaging process, using water applied between the wafer and the lens, is completed on the wet stage. The company develops and sells a range of product options. NXE is based on a new platform utilizing the concepts of the NXT platform. NXE is targeted for production of ICs down to 13 nm and beyond. It is equipped with EUV light source technology, based upon tin plasma, producing light at a wavelength of 13.5 nm. In addition, the NXE system has an optical technology utilizing reflective mirrors rather than the traditional refractive optics with a NA of 0.25 – 0.33. The light in NXE operates in a vacuum environment, through the entire optical train to wafer level. The company owns Cymer, Inc., a supplier of laser light sources for lithography applications. Customers The four major customer sectors to which the company sells its products are integrated device manufacturers and foundries, NAND-Flash memory and DRAM memory chipmakers. Suppliers The company’s supplier includes Carl Zeiss SMT AG, which supplies primary optical systems and other components. Distribution The company markets and sells its products through its direct sales force. Its field sales, field engineers and applications, service and technical support specialists are located throughout Asia, the United States, and Europe. Research and Development The company’s research and development costs included 16.0 million in 2013. Competition The company’s competitors include Nikon Corporation and Canon Kabushiki Kaisha. History The company was founded in 1984. It was formerly known as ASM Lithography Holding N.V., and changed its name to ASML Holding N.V. in 2001. The company was incorporated in the Netherlands in 1994.

 

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