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As of 2:20 AM 09/1/14 All times are local (Market data is delayed by at least 15 minutes).
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Company Description

Contact Info

One Technology Drive

Milpitas, CA 95035

United States

Phone: 408-875-3000

Fax: 408-875-4144

KLA-Tencor Corporation supplies process control and yield management solutions for the semiconductor and related nanoelectronics industries. The company’s products are also used in various other high technology industries, including the light emitting diode (LED) and data storage industries, as well as general materials research. Products The company provides a portfolio of defect inspection and metrology products, and related service, software and other offerings. Its defect inspection and metrology products and related offerings can be broadly categorized into the following groups: chip manufacturing, wafer manufacturing, reticle manufacturing, LED and compound semiconductor manufacturing, data storage media/head manufacturing, microelectromechanical systems (MEMS) manufacturing, and general purpose/lab applications. The company also provides refurbished KLA-Tencor tools as part of its K-T Certified program for customers manufacturing larger design-rule devices, as well as comprehensive service and support for its products. Chip Manufacturing The company’s comprehensive portfolio of defect inspection and metrology products, and related service, software and other offerings, helps chip manufacturers manage yield throughout the entire semiconductor fabrication process—from research and development to final volume production. Front-End Defect Inspection The company’s front-end defect inspection tools cover a range of yield applications within the integrated circuit (IC or chip) manufacturing environment, including research and development; incoming wafer qualification; reticle qualification; and tool, process and line monitoring. Patterned and unpatterned wafer inspectors find particles, pattern defects and electrical issues on the front surface, back surface and edge of the wafer, allowing engineers to detect and monitor critical yield excursions. Fabs rely on its high sensitivity reticle inspection systems to identify defects in reticles at an early stage, to prevent reticle defects from printing on production wafers. The defect data generated by its inspectors is compiled and reduced to relevant root-cause and yield-analysis information with its suite of data management tools. By implementing its front-end defect inspection and analysis systems, chipmakers are able to take corrective action, resulting in faster yield improvement and better time to market. During the fiscal year ended June 30, 2014, the company launched various front-end defect inspection products that help accelerate yield for next-generation design node devices. In 2013, the company launched the 2910 Series broadband plasma patterned wafer inspection systems that are used to discover and monitor defects to support advanced IC development and ramp. This was followed in May 2014 with its launch of the Teron SL650, a reticle inspection system that utilizes 193nm illumination and multiple STARlight technologies to assess incoming reticle quality, monitor reticle degradation and detect yield-critical reticle defects. In the field of patterned wafer inspection, the company offers its 2910 Series, 2900 Series, 2830 Series, 2820 Series and 2810 Series systems (for broadband plasma defect inspection); its Puma 9650 Series and Puma 9500 Series systems (for laser scanning defect inspection); its eS805 Series and eS800 Series systems (for electron-beam defect inspection); its 8900 system (for macro defect inspection); and its CIRCL cluster tool (for macro defect inspection and review of all wafer surfaces - front side, edge and back side). In the field of unpatterned wafer and surface inspection, the company offers the Surfscan SP3 Series (wafer defect inspection systems for process tool qualification and monitoring using blanket films and bare wafers); and the SURFmonitor (integrated on the Surfscan SP3 Series), which enables surface quality measurements and capture of low-contrast defects. For reticle inspection, the company offers its X5.2 and Teron SL650 Series products, which are photomask inspection systems that allow IC fabs to qualify incoming reticles and inspect production reticles for contaminants and other process-related cha

 

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KLA

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Valuation KLA Industry Range
Price/Earnings 22.0x
Price/Sales 4.3x
Price/Book 3.4x
Price/Cash Flow 21.7x
TEV/Sales 3.0x
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